Solid State Science and Technology, Vol. 14, No 1(2006) 34-38
THE NUCLEATION AND GROWTH OF SILICON NANOFILMS IN SUPERCOOLED LIQUID/SOLID PHASE
Samsudi Sakrani1, Lim Qiao Jie1and Yussof Wahab2
1Ibnu Sina Institute for Fundamental Science Studies, 81310 UTM Skudai Johor
2Physics Department, Faculty of Science, 81310 UTM Skudai Johor, Malaysia
The formation of silicon nanofilms can be described using an approach of nucleation and island growth mechanism with enhanced supercooling. The theoretically derived parameters (ÄG, ÄG*, r*, ÄGv, ÄT) were found to be in the acceptable ranges that, Si nanofilms resembling 8 nm quantum dots could be fabricated on the substrate at extremely low nucleation rates. A Volmer-Weber growth model was used to explain the growth mode, initially by the aggregation of nuclei which increase in size leading to a liquid/solid phase transition. The resulting Si nanofilms were expected to be in an unwetting oval-shaped due to stronger nuclei-nuclei interactions.
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